Title:
METHOD FOR FORMING PHOTO-DEFINED MICRO ELECTRICAL CONTACTS
Document Type and Number:
WIPO Patent Application WO2005043594
Kind Code:
B1
Abstract:
A method of manufacturing a probe test head for testing of semiconductor integrated circuits includes: defining shapes of a plurality of probes (81) as one or more masks (73); a step for fabricating the plurality of probes using the mask (73); and disposing the plurality of probes (81) through corresponding holes in a first die (42) and a second die (44). The step for fabricating the plurality of probes (81) may include one of photo-etching and photo-defined electroforming.
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Inventors:
MCQUADE FRANCIS T
BARTO CHARLES L
TRUCKLE PHILLIP M
BARTO CHARLES L
TRUCKLE PHILLIP M
Application Number:
PCT/US2004/034963
Publication Date:
December 22, 2005
Filing Date:
October 22, 2004
Export Citation:
Assignee:
WENTWORTH LAB INC (US)
International Classes:
G01R1/067; G01R1/073; G01R3/00; G01R31/02; H01L21/00; G01R31/26; H01L21/44; H01L21/66; H01R9/00; H01R43/00; H01L; (IPC1-7): G01R31/02; H01R43/00; H01R9/00; H05R3/02; H01L21/00; H01L21/44
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