Title:
METHOD FOR FORMING RESIST PATTERN, AND COMPOSITION FOR FORMING RESIST PATTERN
Document Type and Number:
WIPO Patent Application WO/2015/030198
Kind Code:
A1
Abstract:
A method for forming a resist pattern using a composition for resist pattern formation which comprises a polymerizable monomer that is liquid at room temperature, an organic gellant, and a photopolymerization initiator, the method comprising: a step in which the composition for resist pattern formation is prepared; a step in which the prepared composition for resist pattern formation is applied to a substrate to form a coating film; a step in which the organic gellant contained in the coating film is made to gel; and a step in which the coating film in which the organic gellant has gelled is patterned.
Inventors:
SATO TETSUO (JP)
Application Number:
PCT/JP2014/072800
Publication Date:
March 05, 2015
Filing Date:
August 29, 2014
Export Citation:
Assignee:
NISSAN CHEMICAL IND LTD (JP)
International Classes:
G03F7/004; G03F7/38; H01L21/027
Domestic Patent References:
| WO2014115887A1 | 2014-07-31 |
Foreign References:
| JP2003270782A | 2003-09-25 | |||
| JP2004004263A | 2004-01-08 | |||
| JPH08211596A | 1996-08-20 | |||
| JPS63287845A | 1988-11-24 | |||
| JPH04225009A | 1992-08-14 | |||
| JP2002244280A | 2002-08-30 | |||
| JP2013061639A | 2013-04-04 | |||
| JP2006054069A | 2006-02-23 | |||
| JP2004098387A | 2004-04-02 | |||
| JP2004117980A | 2004-04-15 | |||
| JPH1184682A | 1999-03-26 |
Attorney, Agent or Firm:
KURIHARA, Hiroyuki et al. (JP)
Hiroyuki Kurihara (JP)
Hiroyuki Kurihara (JP)
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