Title:
METHOD OF FORMING SEMICONDUCTOR COMPOUND FILM FOR FABRICATION OF ELECTRONIC DEVICE AND FILM PRODUCED BY SAME
Document Type and Number:
WIPO Patent Application WO2002084708
Kind Code:
A3
Abstract:
A process of forming a compound film includes formulating a nano-powder material with a controlled overall composition and including particles of one solid solution. The nano-powder material is deposited on a substrate (70) to form a layer (52) on the substrate, and the layer is reacted in at least one suitable atmosphere to form the compound film. The compound film may be used in fabrication of a radiation detector or solar cell.
Inventors:
BASOL BULENT M (US)
Application Number:
PCT/US2002/011047
Publication Date:
April 08, 2004
Filing Date:
April 11, 2002
Export Citation:
Assignee:
BASOL BULENT M (US)
International Classes:
B32B5/16; B32B18/00; C23C8/02; C23C10/02; C23C12/00; C23C24/00; C23C24/08; C23C26/00; H01L21/00; H01L21/31; H01L21/8238; H01L31/032; H01L31/18; H01L; (IPC1-7): H01L21/00; B32B5/16; B32B18/00; H01L21/31
Foreign References:
US5665277A | 1997-09-09 | |||
US5874684A | 1999-02-23 | |||
US6576355B2 | 2003-06-10 | |||
US6616794B2 | 2003-09-09 | |||
US6630257B2 | 2003-10-07 | |||
US6635307B2 | 2003-10-21 |
Other References:
See also references of EP 1428243A4
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