Title:
METHOD FOR INACTIVATION BY ELECTRON BEAM IRRADIATION AND TREATMENT APPARATUS
Document Type and Number:
WIPO Patent Application WO/2013/054539
Kind Code:
A1
Abstract:
The present invention provides a method for inactivation by electron beam irradiation, and a treatment apparatus, whereby irrespective of the shape of the object to be treated and/or the retention form of the object to be treated, microorganisms can be inactivated uniformly with a simple configuration, and also whereby damage to the object to be treated caused by electron beams can be reduced in spite of the use of electron beams. A treatment apparatus for inactivating microorganisms as in one embodiment of the present invention is provided with: a treatment chamber; an electron beam irradiation device for irradiating the inside of the treatment chamber with electron beams; a retaining unit for retaining the object to be treated, the retaining unit being furnished within the treatment chamber; and a gas nozzle configured so as to supply a predetermined gas that has been excited by electron beams to the object to be treated retained by the retaining unit.
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Inventors:
KASAHARA TETSUYA (JP)
INOI KAZUYOSHI (JP)
TERADA HIROICHI (JP)
HADA HIROAKI (JP)
KINOSHITA SHINOBU (JP)
MATSUMOTO HIROYUKI (JP)
YOSHINO KIYOSHI (JP)
HOSHINO SAYO (JP)
IDE TAKASHI (JP)
INOI KAZUYOSHI (JP)
TERADA HIROICHI (JP)
HADA HIROAKI (JP)
KINOSHITA SHINOBU (JP)
MATSUMOTO HIROYUKI (JP)
YOSHINO KIYOSHI (JP)
HOSHINO SAYO (JP)
IDE TAKASHI (JP)
Application Number:
PCT/JP2012/006561
Publication Date:
April 18, 2013
Filing Date:
October 12, 2012
Export Citation:
Assignee:
IWASAKI ELECTRIC CO LTD (JP)
International Classes:
A61L2/20; B65B55/08
Foreign References:
| JP2003508874A | 2003-03-04 | |||
| JP2010524784A | 2010-07-22 | |||
| JP2011095077A | 2011-05-12 | |||
| JP2000334028A | 2000-12-05 | |||
| JPH08151021A | 1996-06-11 | |||
| JP2009538787A | 2009-11-12 |
Attorney, Agent or Firm:
OKABE, Yuzuru et al. (JP)
Okabe 讓 (JP)
Okabe 讓 (JP)
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Claims: