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Title:
METHOD OF INCREASING THE CONDUCTIVITY OF A TRANSPARENT CONDUCTIVE LAYER
Document Type and Number:
WIPO Patent Application WO2002044805
Kind Code:
A3
Abstract:
A method of increasing the conductivity of a transparent conductive layer, in which a photoresist layer which patterns the transparent layer is given tapered edges and is partially etched. The partial etching exposing the edge regions of the underlying transparent conductor layer, which are the selectively plated. This method has a single patterning stage of the transparent layer, but uses partial etching of a tapered resist layer in order to expose a small edge region of the transparent layer for coating with a conductive layer (which can be opaque).

Inventors:
FRENCH IAN D
VAN DER ZAAG PIETER J
Application Number:
PCT/EP2001/014215
Publication Date:
November 28, 2002
Filing Date:
November 29, 2001
Export Citation:
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Assignee:
KONINKL PHILIPS ELECTRONICS NV (NL)
International Classes:
G02F1/1345; G02F1/1362; G02F1/1368; G02F1/1343; G03F7/40; H01B13/00; H01L21/288; H01L21/3205; H01L21/336; H01L29/786; (IPC1-7): G02F1/1362; G02F1/1345; H01B1/08
Domestic Patent References:
WO1999059024A21999-11-18
Foreign References:
EP0372356A21990-06-13
EP0269123A21988-06-01
Other References:
PATENT ABSTRACTS OF JAPAN vol. 018, no. 454 (P - 1791) 24 August 1994 (1994-08-24)
PATENT ABSTRACTS OF JAPAN vol. 009, no. 274 (E - 354) 31 October 1985 (1985-10-31)
PATENT ABSTRACTS OF JAPAN vol. 1996, no. 09 30 September 1996 (1996-09-30)
PATENT ABSTRACTS OF JAPAN vol. 010, no. 053 (P - 433) 4 March 1986 (1986-03-04)
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