Title:
METHOD FOR INSPECTING QUALITY OF CHEMICAL FLUID
Document Type and Number:
WIPO Patent Application WO/2018/128159
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a quality inspection method by which defect performance can be conveniently evaluated. The quality inspection method of the present invention is a method for inspecting the quality of a chemical fluid used in the production of a semiconductor substrate, and comprises, in following order: a step W for preparing a first container, and washing at least a portion of a fluid-contacting portion by using a portion of the chemical fluid; a step A for obtaining a c fluid by concentrating a portion of the chemical fluid by using the washed first container; a step B for measuring the content of a specific component in the c fluid; and a step C for comparing the content of the specific component with a predetermined reference value. At least the step W and the step A are performed in a clean room having a Class 4 purity or higher as defined by ISO14644-1:2015. Concentration is performed under at least one inert gas selected from the group consisting of Ar gas, He gas, and N2 gas, or is performed under reduced pressure. Measurement is performed by a predetermined measurement scheme.
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Inventors:
KAMIMURA TETSUYA (JP)
Application Number:
PCT/JP2017/047208
Publication Date:
July 12, 2018
Filing Date:
December 28, 2017
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G01N21/31; G01N33/00; G01N24/08; G01N27/62; G01N30/72; G01N30/86; G01N30/88; G03F7/26; H01L21/027; H01L21/304
Foreign References:
| JP2015197646A | 2015-11-09 | |||
| JP2010169871A | 2010-08-05 | |||
| JP2016073922A | 2016-05-12 | |||
| JP2015049395A | 2015-03-16 | |||
| JP2015072418A | 2015-04-16 | |||
| US20130108958A1 | 2013-05-02 |
Attorney, Agent or Firm:
WATANABE Mochitoshi et al. (JP)
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