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Title:
METHOD AND INSTALLATION FOR PRODUCING METALLISED SEMICONDUCTOR SUBSTRATES
Document Type and Number:
WIPO Patent Application WO/2011/042324
Kind Code:
A3
Abstract:
The invention relates to a method for producing metallised semiconductor substrates, in which a substrate is immersed in a coating bath, where it is coated in a preferably light-induced or light-assisted manner. The coated substrate is then transferred to a rinsing device for removing metal residue from the electrolyte. In the rinsing device, the substrate is subjected to a cascade rinsing process. Metal-containing rinsing medium that accrues during the rinsing process is at least partially fed back into the coating bath. The invention further relates to an installation for carrying out such a method.

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Inventors:
SCHMID CHRISTIAN (DE)
KAPPLER HEINZ (DE)
HABERMANN DIRK (DE)
Application Number:
PCT/EP2010/064237
Publication Date:
June 30, 2011
Filing Date:
September 27, 2010
Export Citation:
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Assignee:
SCHMID GMBH & CO GEB (DE)
SCHMID CHRISTIAN (DE)
KAPPLER HEINZ (DE)
HABERMANN DIRK (DE)
International Classes:
C25D21/08; C25D7/12; C25D21/18; C25D21/20
Domestic Patent References:
WO2009012891A12009-01-29
WO2009015886A12009-02-05
Foreign References:
US3640331A1972-02-08
GB2001101A1979-01-24
US4611409A1986-09-16
Attorney, Agent or Firm:
PATENTANWÄLTE RUFF, WILHELM, BEIER, DAUSTER & PARTNER (Stuttgart, DE)
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