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Title:
METHOD OF LOW-TEMPERATURE PLASMA GENERATION, METHOD OF AN ELECTRICALLY CONDUCTIVE OR FERROMAGNETIC TUBE COATING USING PULSED PLASMA AND CORRESPONDING DEVICES
Document Type and Number:
WIPO Patent Application WO/2019/210891
Kind Code:
A1
Abstract:
The present invention resides in the unifying idea of ​​synchronizing a positive voltage pulse (U+) supplied to an electrically conductive or ferromagnetic tube (21) and a exciting negative voltage pulse (UC) on a hollow cathode (14) induced on the background of a high-frequency capacitive discharge. In one embodiment, the invention relates to a method of generating low-temperature plasma (11) in a vacuum chamber (1) comprising a hollow cathode (14) and an electrode (21E), the method comprising the step of igniting the pulsed DC discharge (11) in the hollow cathode wherein the positive voltage pulse (U+) at least partially overlaps with the negative voltage pulse (UC), and the positive voltage pulse (U +) at least partially overlaps with the negative voltage pulse (UC) on the hollow cathode (14). In another embodiment, the present invention relates to a method of coating the inner walls of hollow tubes (21) which utilizes the above-mentioned low-temperature plasma generation process. In another embodiment, the invention relates to a low-temperature plasma generating device (11) comprising a hollow cathode (14) located in the vacuum chamber (1), a RF plasma source (18), a pulse DC burst source (18), and a bipolar pulse source. In another embodiment, an object of the invention is an apparatus adapted to coat the inner sides of hollow tubes (21) comprising a low-temperature plasma generating device.

Inventors:
HUBIČKA, Zdeněk (Štěpařská 1196/18, Praha 5 - Hlubočepy, 15200, CZ)
ČADA, Martin (Sicherova 1606/13, Praha 9, 19800, CZ)
KŠÍROVÁ, Petra (Na Slovance 1999/2, Praha 8, 18221, CZ)
KLINGER, Miloslav (Na Slovance 1999/2, Praha 8, 18221, CZ)
Application Number:
CZ2019/050019
Publication Date:
November 07, 2019
Filing Date:
May 02, 2019
Export Citation:
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Assignee:
FYZIKALNI USTAV AV CR, V.V.I. (Na Slovance 1999/2, Praha 8, 18221, CZ)
International Classes:
C23C16/517; C23C16/04; H01J37/32
Domestic Patent References:
WO2012142038A12012-10-18
Foreign References:
US20060196419A12006-09-07
US20070256926A12007-11-08
CZ2016455A32017-08-09
CZ305631B62016-01-13
CZ283407B61998-04-15
US3830721A1974-08-20
US4637853A1987-01-20
US20070256926A12007-11-08
CZ17135U12007-01-17
Other References:
Z. HUBICKA ET AL: "Deposition of hematite Fe2O3 thin film by DC pulsed magnetron and DC pulsed hollow cathode sputtering system", THIN SOLID FILMS, vol. 549, 1 December 2013 (2013-12-01), AMSTERDAM, NL, pages 184 - 191, XP055581293, ISSN: 0040-6090, DOI: 10.1016/j.tsf.2013.09.031
J.MENG; X.T YANG; J.H.ZHANG; W S.YANG; D.Z.GUO; Z.J.COCKEYED; Y.G.ZHAO; S.J.WHOA; C. LUO, RESEARCH OF TIZRV PUMPING COATINGS HE THE INNER WALLS OF VACUUM CHAMBER PHYSICS PROCEDIA, vol. 32, 2012, pages 865 - 868
T. KRAUS; J. KECKES; J.K.N. LINDNER; W. ENSINGER; B. STRITZKER: "Coating The Inner Walls Of Tubes With TiN Films By Reactive Sputtering", AIP CONFERENCE PROCEEDINGS, vol. 680, 2003, pages 830, XP055581296, DOI: doi:10.1063/1.1619839
Z. HUBICKA; S. KMENT; J. OLEJNICEK; M. CADA; T. KUBART; M. BRUNCLIKOVA; P. KSIROVA; P. ADAMEK; Z. RETRIES: "Deposition of hematite Fe203 thin film by DC pulsed magnetron and DC pulsed hollow cathode sputtering system", THIN SOLID FILMS, vol. 549, 2013, pages 184 - 191, XP055581293, DOI: doi:10.1016/j.tsf.2013.09.031
Attorney, Agent or Firm:
BAUER, Karel (Za Radnici 835, Dolni Brezany, 25241, CZ)
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