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Title:
METHOD FOR MAKING MICROMECHANICAL STRUCTURES HAVING AT LEAST ONE LATERAL, SMALL GAP THEREBETWEEN AND MICROMECHANICAL DEVICE PRODUCED THEREBY
Document Type and Number:
WIPO Patent Application WO2002016256
Kind Code:
A3
Abstract:
A method and resulting formed device are disclosed wherein the method combines polysilicon surface-micromachining with metal electroplating technology to achieve a capacitively-drive, lateral micromechanical resonator with submicron electrode-to-resonator capacitor gaps. Briefly, surface-micromachining is used to achieve the structural material for a resonator, while conformal metal-plating is used to implement capacitive transducer electrodes. This technology makes possible a variety of new resonator configurations, including disk resonators and lateral clamped-clamped and free-free flexural resonators, all with significant frequency and Q advantages over vertical resonators. In addition, this technology introduces metal electrodes, which greatly reduces the series resistance in electrode interconnects, thus, minimizing Q-loading effects while increasing the power handling ability of micromechanical resonators.

Inventors:
HSU WAN-THAI (US)
CLARK JOHN R (US)
NGUYEN CLARK T-C (US)
Application Number:
PCT/US2001/041874
Publication Date:
September 12, 2002
Filing Date:
August 24, 2001
Export Citation:
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Assignee:
UNIV MICHIGAN (US)
HSU WAN-THAI (US)
CLARK JOHN R (US)
NGUYEN CLARK T-C (US)
International Classes:
B81B3/00; H03H3/007; H03H3/013; H03H9/02; H03H9/24; H03H9/46; H03H9/50; (IPC1-7): H03H3/007; H03H9/24
Other References:
C. T.-C. NGUYEN: "MICROMACHINING TECHNOLOGIES FOR MINIATURIZED COMMUNICATION DEVICES", PROCEEDINGS OF SPIE: MICROMACHINING AND MICROFABRICATION, 20 September 1998 (1998-09-20) - 22 September 1998 (1998-09-22), SANTA CLARA, CALIFORNIA, pages 24 - 38, XP002189446, Retrieved from the Internet [retrieved on 20020206]
TOSHIKI HIRANO ET AL: "DESIGN, FABRICATION, AND OPERATION OF SUBMICRON GAP COMB-DRIVE MICROACTUATORS", JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, IEEE INC. NEW YORK, US, vol. 1, no. 1, 1 March 1992 (1992-03-01), pages 52 - 59, XP000304102, ISSN: 1057-7157
TUCKER J R ET AL: "Nanoscale FETs and STM lithography", HIGH SPEED SEMICONDUCTOR DEVICES AND CIRCUITS, 1995. PROCEEDINGS., IEEE/CORNELL CONFERENCE ON ADVANCED CONCEPTS IN ITHACA, NY, USA 7-9 AUG. 1995, NEW YORK, NY, USA,IEEE, US, 7 August 1995 (1995-08-07), pages 425 - 434, XP010154259, ISBN: 0-7803-2442-0
NGUYEN C T-C: "High-Q micromechanical oscillators and filters for communications", CIRCUITS AND SYSTEMS, 1997. ISCAS '97., PROCEEDINGS OF 1997 IEEE INTERNATIONAL SYMPOSIUM ON HONG KONG 9-12 JUNE 1997, NEW YORK, NY, USA,IEEE, US, PAGE(S) 2825-2828, ISBN: 0-7803-3583-X, XP010236317
TANAKA K: "Nanotechnology towards the 21st Century", THIN SOLID FILMS, ELSEVIER-SEQUOIA S.A. LAUSANNE, CH, vol. 341, no. 1-2, 12 March 1999 (1999-03-12), pages 120 - 125, XP004166376, ISSN: 0040-6090
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