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Patent Searching and Data


Title:
METHOD FOR THE MANUFACTURE OF A CORRELATED ELECTRON MATERIAL DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/008328
Kind Code:
A3
Abstract:
The present techniques relate to a method for the manufacture of a CEM device comprising forming a thin film of a correlated electron material having a predetermined electrical impedance when the CEM device in its relatively conductive (low impedance) state, wherein the forming of the CEM thin film comprises forming a d- or f-block metal or metal compound doped by a physical or chemical vapour deposition with a predetermined amount of a dopant comprising a back-donating ligand for the metal.

Inventors:
ARAUJO, Carlos (110 Fulbourn Road, Cambridge CB1 9NJ, CB1 9NJ, GB)
CELINSKA, Jolanta (110 Fulbourn Road, Cambridge CB1 9NJ, CB1 9NJ, GB)
SHIFREN, Lucian (110 Fulbourn Road, Cambridge CB1 9NJ, CB1 9NJ, GB)
Application Number:
GB2018/051822
Publication Date:
April 04, 2019
Filing Date:
June 28, 2018
Export Citation:
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Assignee:
ARM LIMITED (110 Fulbourn Road, Cambridge CB1 9NJ, CB1 9NJ, GB)
International Classes:
H01L45/00
Domestic Patent References:
WO2009114796A12009-09-17
Foreign References:
US20140061579A12014-03-06
US20080106927A12008-05-08
US20160163978A12016-06-09
US20150179316A12015-06-25
US20080012064A12008-01-17
US20140273314A12014-09-18
Other References:
CELINSKA JOLANTA ET AL: "Material and process optimization of correlated electron random access memories", JOURNAL OF APPLIED PHYSICS, AMERICAN INSTITUTE OF PHYSICS, US, vol. 109, no. 9, 13 May 2011 (2011-05-13), pages 91603 - 91603, XP012148990, ISSN: 0021-8979, DOI: 10.1063/1.3581197
Attorney, Agent or Firm:
TLIP LTD (14 King Street, Leeds LS1 2HL, LS2 9DF, GB)
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