Title:
METHOD FOR MANUFACTURING ANTI-REFLECTIVE SURFACE USING PLASMA ETCHING, AND SUBSTRATE HAVING ANTI-REFLECTIVE SURFACE FORMED THEREON
Document Type and Number:
WIPO Patent Application WO/2017/034262
Kind Code:
A1
Abstract:
The present invention relates to a method for manufacturing an anti-reflective surface, which controls an anti-reflective structure layer, which is formed through repeated controls of plasma dry etching and inorganic deposition, with various structures, and can thus enhance durability and secure excellent light transmittance and anti-reflection effect while imparting functionalities such as easy cleaning, contamination resistance, scratch resistance, etc.; and to a substrate having an anti-reflective surface formed thereon.
Inventors:
KIM HYUN JOONG (KR)
KIM HONG CHUL (KR)
KIM JOUNG RAE (KR)
CHOI BYEONG GYEONG (KR)
WANG HONG RAE (KR)
KWON AH HYUN (KR)
SHIN DONG HYUN (KR)
LEE SUNG DO (KR)
RHA JONG JOO (KR)
KWON JUNG DAE (KR)
KIM HONG CHUL (KR)
KIM JOUNG RAE (KR)
CHOI BYEONG GYEONG (KR)
WANG HONG RAE (KR)
KWON AH HYUN (KR)
SHIN DONG HYUN (KR)
LEE SUNG DO (KR)
RHA JONG JOO (KR)
KWON JUNG DAE (KR)
Application Number:
PCT/KR2016/009245
Publication Date:
March 02, 2017
Filing Date:
August 22, 2016
Export Citation:
Assignee:
CEKO CO LTD (KR)
KOREA MACH & MATERIALS INST (KR)
KOREA MACH & MATERIALS INST (KR)
International Classes:
H01L21/3065; H01L21/56; H01L31/0216
Foreign References:
| KR101244889B1 | 2013-03-18 | |||
| KR20140074874A | 2014-06-18 | |||
| KR101205004B1 | 2012-11-27 | |||
| KR20110019143A | 2011-02-25 | |||
| US20100246016A1 | 2010-09-30 |
Attorney, Agent or Firm:
HANSUNG INTELLECTUAL PROPERTY (KR)
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