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Patent Searching and Data


Title:
METHOD FOR MANUFACTURING ARRAY SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2018/018351
Kind Code:
A1
Abstract:
Disclosed is a method for manufacturing an array substrate. The method comprises: forming a signal transmission line (120) and a gate electrode (130) on a substrate (110), with a gap being provided between the signal transmission line (120) and the gate electrode (130); forming a gate insulation layer (140) and an active layer (150) on the signal transmission line (120) and the gate electrode (130); forming an organic insulation layer (160) on the gate insulation layer (140) and the active layer (150); patterning the organic insulation layer (160) so as to form a through hole (1601) corresponding to the signal transmission line (120); etching, by means of using the patterned organic insulation layer (160) as a mask, the gate insulation layer (140) so as to expose the signal transmission line (120); and forming a first conductive layer (170) on the through hole (1601) so as to conduct the signal transmission line (120). In the method, the array substrate can be manufactured by means of only four photomasks, reducing the photomasks by one compared with the prior art, thereby simplifying the manufacturing process and reducing the manufacturing cost.

Inventors:
YUAN ZE (CN)
YU XIAOJUN (CN)
GUPTA AMIT (CN)
WEI PENG (CN)
Application Number:
PCT/CN2016/091520
Publication Date:
February 01, 2018
Filing Date:
July 25, 2016
Export Citation:
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Assignee:
SHENZHEN ROYOLE TECHNOLOGIES CO LTD (CN)
International Classes:
H01L21/77; G02F1/1362
Foreign References:
CN102707523A2012-10-03
CN102645808A2012-08-22
CN105161495A2015-12-16
CN104218019A2014-12-17
KR20090100046A2009-09-23
Other References:
None
Attorney, Agent or Firm:
GUANGZHOU SCIHEAD PATENT AGENT CO., LTD. (CN)
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