Title:
METHOD OF MANUFACTURING BASE SUBSTANCE DISPOSED WITH FINE HOLE, AND BASE SUBSTANCE DISPOSED WITH FINE HOLE
Document Type and Number:
WIPO Patent Application WO/2012/161317
Kind Code:
A1
Abstract:
Provided is a method of manufacturing a base substance having a fine hole, including: forming a first modification portion and a second modification portion, which have etch selectivity, by performing scanning of a focus of a first laser beam having the time width of not more than picosecond order, inside the base substance; forming a first remodification portion, in which a modification state of a first part of the first modification portion is denatured, and a second remodification portion, in which a modification state of a first part of the second modification portion is denatured, by performing scanning of a focus of a second laser beam having the time width of not more than picosecond order so that the first part of the first modification portion and the first part of the second modification portion overlap with each other; enhancing the etching resistance of the first remodification portion and the second remodification portion by heating the first remodification portion and the second remodification portion; and forming a fine hole in the base substance by removing the first modification portion and the second modification portion other than the first remodification portion and the second remodification portion with etching.
Inventors:
NUKAGA OSAMU (JP)
YAMAMOTO SATOSHI (JP)
TABATA KAZUHITO (JP)
SUGIYAMA MASAKAZU (JP)
YAMAMOTO SATOSHI (JP)
TABATA KAZUHITO (JP)
SUGIYAMA MASAKAZU (JP)
Application Number:
PCT/JP2012/063500
Publication Date:
November 29, 2012
Filing Date:
May 25, 2012
Export Citation:
Assignee:
FUJIKURA LTD (JP)
BIO ELECTRO MECHANICAL AUTONOMOUS NANO SYSTEMS LAB TECHNOLOGY RES ASS (JP)
UNIV TOKYO (JP)
NUKAGA OSAMU (JP)
YAMAMOTO SATOSHI (JP)
TABATA KAZUHITO (JP)
SUGIYAMA MASAKAZU (JP)
BIO ELECTRO MECHANICAL AUTONOMOUS NANO SYSTEMS LAB TECHNOLOGY RES ASS (JP)
UNIV TOKYO (JP)
NUKAGA OSAMU (JP)
YAMAMOTO SATOSHI (JP)
TABATA KAZUHITO (JP)
SUGIYAMA MASAKAZU (JP)
International Classes:
B23K26/40; B23K26/00; B23K26/04; B23K26/36; B81C99/00; C03C15/00; C03C23/00
Foreign References:
| JP2003340579A | 2003-12-02 | |||
| JP2004160618A | 2004-06-10 | |||
| JP2004223586A | 2004-08-12 | |||
| JP2005161372A | 2005-06-23 | |||
| JP2006303360A | 2006-11-02 | |||
| JP2008288577A | 2008-11-27 | |||
| JP2010142837A | 2010-07-01 | |||
| JP2010155259A | 2010-07-15 | |||
| JP2010221573A | 2010-10-07 |
Attorney, Agent or Firm:
SHIGA Masatake et al. (JP)
Masatake Shiga (JP)
Masatake Shiga (JP)
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Claims: