Title:
METHOD FOR MANUFACTURING COLOUR FILM SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2019/051968
Kind Code:
A1
Abstract:
Provided is a method for manufacturing a colour film substrate, comprising the steps of: providing a substrate, wherein the substrate comprises a colour film area and a black matrix area; forming a black matrix in the black matrix area on a surface of the substrate; coating an RGB colour resist in the colour film area of the substrate; correspondingly forming a photo spacer on a surface of the black matrix, wherein the photo spacer is made of a light-shielding material; and forming a protective layer above the substrate, wherein the photo spacer made of a light-shielding material is arranged on the surface of the black matrix and is used for preventing light rays from penetrating the RGB colour resist to cause colour mixing.
Inventors:
LI WENJIE (CN)
Application Number:
PCT/CN2017/109837
Publication Date:
March 21, 2019
Filing Date:
November 08, 2017
Export Citation:
Assignee:
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECH CO LTD (CN)
International Classes:
G02F1/1335; G02B5/23; G02F1/1339
Foreign References:
| CN102707483A | 2012-10-03 | |||
| CN104793391A | 2015-07-22 | |||
| CN106653768A | 2017-05-10 | |||
| CN106842662A | 2017-06-13 | |||
| CN106094361A | 2016-11-09 | |||
| CN102623644A | 2012-08-01 | |||
| CN103293777A | 2013-09-11 | |||
| KR20050059797A | 2005-06-21 | |||
| US20050112485A1 | 2005-05-26 | |||
| CN101046627A | 2007-10-03 | |||
| CN1673822A | 2005-09-28 | |||
| JP2001142081A | 2001-05-25 |
Attorney, Agent or Firm:
ESSEN PATENT&TRADEMARK AGENCY (CN)
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