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Title:
METHOD FOR MANUFACTURING COMPOSITION THAT INCLUDES POORLY WATER-SOLUBLE AROMATIC COMPOUND
Document Type and Number:
WIPO Patent Application WO/2019/131975
Kind Code:
A1
Abstract:
Provided is a novel method for manufacturing a composition that contains a poorly water-soluble aromatic compound, the composition having outstanding poorly water-soluble aromatic compound solubility. The method for manufacturing a composition that includes a poorly water-soluble aromatic compound includes: a step (1) for obtaining a poorly water-soluble aromatic compound solution 1, which includes a step (1-1) in which a heat treatment raw material that contains (A) a poorly water-soluble aromatic compound, (B) a polyol, and (C) an aqueous medium is prepared, and a step (1-2) in which the heat treatment raw material is heat-treated under normal pressure at a temperature below 100°C to obtain a heat-treated liquid that contains the poorly water-soluble aromatic compound; and a step (2) in which a poorly water-soluble aromatic compound solution 2, in which (A) the poorly water-soluble aromatic compound is present at the concentration exceeding the saturated solubility at 25°C, is obtained by adding water to the poorly water-soluble aromatic compound solution 1. In step (1), the content of a surfactant in the heat treatment raw material is 0.1% by mass or less, and the content of (A) the poorly water-soluble aromatic compound in the heat treatment raw material is below the saturation solubility of (A) the poorly water-soluble aromatic compound in a solvent with the same composition at 25°C.

Inventors:
SUZUKI TAKASHI (JP)
ABE TETSUYA (JP)
TAKAHASHI RUI (JP)
ENDO KOJI (JP)
HAGURA TOYOKI (JP)
IWAI HIDETAKA (JP)
HORIZUMI TERUO (JP)
AOSAKI TAISUKE (JP)
UDA AKIHIRO (JP)
NAKAMICHI MASATO (JP)
Application Number:
PCT/JP2018/048376
Publication Date:
July 04, 2019
Filing Date:
December 27, 2018
Export Citation:
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Assignee:
KAO CORP (JP)
International Classes:
A61K8/02; A61K8/34; A61K8/37; A61K9/08; A61K47/10
Foreign References:
JP2008031126A2008-02-14
JP2015205873A2015-11-19
JP2015533170A2015-11-19
JP2014139164A2014-07-31
JP2003502353A2003-01-21
US20160250129A12016-09-01
JP2016145180A2016-08-12
JP2005082506A2005-03-31
JP2011098919A2011-05-19
JP2014139164A2014-07-31
JPH07188208A1995-07-25
JP2000198779A2000-07-18
Other References:
CHIKA TAKEHARA, TAISUKE AOSAKI, TERUO HORIZUMI, AKIHIRO UDA, RUI TAKAHASHI, HIROKI TANABE, SATOSHI OONO, MASAHIRO MIYAKI, TOYOKI H: "New solubilizing technology of isopropyl methylphenol and its application to cosmetics", PROCEEDINGS OF SCCJ RESEARCH SYMPOSIUM (79TH); NOVEMBER 29 TO NOVEMBER 30, 2016, vol. 79th, 29 November 2016 (2016-11-29), pages 14 - 15, XP009521242
Attorney, Agent or Firm:
THE PATENT CORPORATE BODY ARUGA PATENT OFFICE (JP)
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