Title:
METHOD FOR MANUFACTURING DIFFRACTION LATTICE AND METHOD FOR MANUFACTURING REPLICA DIFFRACTION LATTICE
Document Type and Number:
WIPO Patent Application WO/2023/281950
Kind Code:
A1
Abstract:
According to the present invention, firstly, a wafer 1a is prepared, the wafer having, on a surface FS1 thereof, a pattern 1b that has a shape in which recess sections and protruding sections are alternately disposed. Next, a metal film 3 is formed on the surface FS1 of the wafer 1a, and a transfer region 3a, in which the shape of the pattern 1b is transferred, is formed on a part of a surface FS2 of the metal film 3. Next, the metal film 3 is detached from the wafer 1a. Next, a rear surface BS2 of the metal film 3 is bonded to a glass substrate 5 with an adhesive 4. A diffraction lattice 7 is manufactured as above.
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Inventors:
YAEGASHI KENTA (JP)
EBATA YOSHISADA (JP)
AONO TAKANORI (JP)
EBATA YOSHISADA (JP)
AONO TAKANORI (JP)
Application Number:
PCT/JP2022/022546
Publication Date:
January 12, 2023
Filing Date:
June 02, 2022
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
G02B5/18; B81C1/00
Domestic Patent References:
| WO2019130835A1 | 2019-07-04 | |||
| WO2020021989A1 | 2020-01-30 | |||
| WO2014148118A1 | 2014-09-25 |
Attorney, Agent or Firm:
TSUTSUI & ASSOCIATES (JP)
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