Title:
METHOD FOR MANUFACTURING DISPLAY DEVICE
Document Type and Number:
WIPO Patent Application WO/2011/089990
Kind Code:
A1
Abstract:
Disclosed is a method for manufacturing a display device, wherein a conductive film is provided on a glass substrate without using a sputtering method.
The method has: a chemical polishing step wherein an etching liquid is brought into contact with the surface of the glass substrate for the display device, and the arithmetic average roughness (Ra) of the glass surface is set at 0.7 nm-70 nm; and a film-forming step wherein a conductive polymer is applied to the glass surface that has been subjected to the chemical polishing step, and the conductive film having a resistivity of 400-1200 Ω/sq is formed. The total light transmittance of the glass substrate after being subjected to the film-forming step is set at 87 % or more, said glass substrate having a thickness of 0.5 mm.
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Inventors:
NISHIYAMA, Sakae (1-1-1 Tokura, Toyonaka-sh, Osaka 45, 〒5610845, JP)
Application Number:
JP2011/050630
Publication Date:
July 28, 2011
Filing Date:
January 17, 2011
Export Citation:
Assignee:
NSC CO., LTD. (1-1-1 Tokura, Toyonaka-shi Osaka, 45, 〒5610845, JP)
株式会社ＮＳＣ (〒45 大阪府豊中市利倉１丁目１番１号 Osaka, 〒5610845, JP)
株式会社ＮＳＣ (〒45 大阪府豊中市利倉１丁目１番１号 Osaka, 〒5610845, JP)
International Classes:
G02F1/1333; G02F1/1343; H01B13/00
Attorney, Agent or Firm:
NONAKA, Seiichi et al. (Chiyoda Building Annex 3F, 4-5 Utsubo-Hommachi 1-chome, Nishi-ku, Osaka-sh, Osaka 04, 〒5500004, JP)
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Claims: