Title:
METHOD FOR MANUFACTURING EL ELEMENT, AND EL ELEMENT
Document Type and Number:
WIPO Patent Application WO/2022/190194
Kind Code:
A1
Abstract:
The present invention includes: a step (S31) for forming a first quantum dot layer; a step (S33) for forming a photoresist layer on the first quantum dot layer; steps (S34, S35) for patterning the photoresist layer; a step (S37) for supplying, to only a first portion of the first quantum dot layer, a solution that contains a first molecule having a plurality of coordinating functional groups; and a step (S39) for removing a second portion of the first quantum dot layer and the patterned photoresist layer.
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Inventors:
TAKENAKA YUKIO
YAGUCHI YUMA
YAGUCHI YUMA
Application Number:
PCT/JP2021/009201
Publication Date:
September 15, 2022
Filing Date:
March 09, 2021
Export Citation:
Assignee:
SHARP KK (JP)
International Classes:
G09F9/30; H01L27/32; H01L51/50; H05B33/10; H05B33/14
Foreign References:
| US20190207136A1 | 2019-07-04 | |||
| JP2020161442A | 2020-10-01 | |||
| US20180294414A1 | 2018-10-11 | |||
| CN109935739A | 2019-06-25 | |||
| CN106206972A | 2016-12-07 | |||
| US20200135984A1 | 2020-04-30 | |||
| CN111224018A | 2020-06-02 | |||
| CN109994619A | 2019-07-09 | |||
| CN109935737A | 2019-06-25 | |||
| CN109935725A | 2019-06-25 | |||
| CN109935715A | 2019-06-25 | |||
| CN105098075A | 2015-11-25 | |||
| CN105070849A | 2015-11-18 |
Attorney, Agent or Firm:
HARAKENZO WORLD PATENT & TRADEMARK (JP)
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