Title:
METHOD FOR MANUFACTURING FINE METAL MASK BY USING DRY ETCHING, AND FINE METAL MASK MANUFACTURED THEREBY
Document Type and Number:
WIPO Patent Application WO/2023/096187
Kind Code:
A1
Abstract:
A method for manufacturing a fine metal mask by using dry etching according to the present invention comprises: a metal film attachment step of attaching a metal film to the top of a glass substrate; a photoresist laminating step of laminating a photoresist on the top of the glass substrate to which the metal film is attached; an exposure and development step of exposing and developing the photoresist by using photolithography to pattern same; a dry etching step of etching the metal film to a predetermined depth through dry etching using an ion beam; a rear surface grinding step of grinding the rear surface of the metal film; and a photoresist removal step of removing the photoresist. The method for manufacturing a fine metal mask by using dry etching according to the present invention is advantageous in that an opening is formed at a predetermined angle by using dry etching using an ion beam so as to improve precision, and the surface of the opening can be flattened using an electropolishing method.
Inventors:
CHOI SANG JUN (KR)
Application Number:
PCT/KR2022/016657
Publication Date:
June 01, 2023
Filing Date:
October 28, 2022
Export Citation:
Assignee:
VAULT CREATION CO LTD (KR)
International Classes:
H10K71/00; C23C14/04; C23F4/00; C25F3/22; G03F7/00; H10K99/00
Foreign References:
| KR20160069078A | 2016-06-16 | |||
| KR102225335B1 | 2021-03-10 | |||
| KR20130046303A | 2013-05-07 | |||
| KR20150017191A | 2015-02-16 | |||
| KR20090103631A | 2009-10-01 |
Attorney, Agent or Firm:
JIMYUNG PATENT FIRM (KR)
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