Title:
METHOD OF MANUFACTURING GAS DISCHARGE PANEL
Document Type and Number:
WIPO Patent Application WO/2002/059927
Kind Code:
A1
Abstract:
A method of manufacturing a gas discharge panel, comprising a dielectric layer forming process for forming a dielectric layer on a panel, a dielectric layer cleaning process for cleaning the surface of the dielectric layer formed on the panel, and a protective layer forming process for forming a protective layer.
Inventors:
Yonehara, Hiroyuki (9-10, Nisitamiya-cho Hirakata-shi, Osaka, 573-0025, JP)
Yasui, Hideaki (75-20, Suyama-cho Hirakata-shi, Osaka, 573-1164, JP)
Yasui, Hideaki (75-20, Suyama-cho Hirakata-shi, Osaka, 573-1164, JP)
Application Number:
PCT/JP2002/000417
Publication Date:
August 01, 2002
Filing Date:
January 22, 2002
Export Citation:
Assignee:
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (1006, Oazakadoma Kadoma-shi, Osaka, 571-8501, JP)
Yonehara, Hiroyuki (9-10, Nisitamiya-cho Hirakata-shi, Osaka, 573-0025, JP)
Yasui, Hideaki (75-20, Suyama-cho Hirakata-shi, Osaka, 573-1164, JP)
Yonehara, Hiroyuki (9-10, Nisitamiya-cho Hirakata-shi, Osaka, 573-0025, JP)
Yasui, Hideaki (75-20, Suyama-cho Hirakata-shi, Osaka, 573-1164, JP)
International Classes:
H01J9/02; H01J17/49; (IPC1-7): H01J9/02; H01J9/20
Attorney, Agent or Firm:
Nakajima, Shiro (6F Yodogawa 5-Bankan, 2-1 Toyosaki 3-chome, Kita-k, Osaka-shi Osaka, 531-0072, JP)
Download PDF:
Previous Patent: FABRICATION OF HIGH RESISTIVITY STRUCTURES USING FOCUSED ION BEAMS
Next Patent: ACTIVE RADIO FREQUENCY CAVITY AMPLIFIER
Next Patent: ACTIVE RADIO FREQUENCY CAVITY AMPLIFIER