Title:
METHOD FOR MANUFACTURING ILLUMINANCE ADJUSTMENT FILTER, ILLUMINANCE ADJUSTMENT FILTER, LIGHTING OPTICAL SYSTEM, AND EXPOSURE DEVICE
Document Type and Number:
WIPO Patent Application WO/2018/003418
Kind Code:
A1
Abstract:
This method for manufacturing an illuminance adjustment filter comprises steps of: measuring illuminance I(i) at an arbitrary point i (i is an integer) on an exposure surface with no optical filter (90) placed in an optical path EL; calculating the optical transmittance distribution for each cell (91) on the basis of the measured illuminance I(i) at each point; and forming an optical filter (90) including cells (91) each having a pattern (93) corresponding to the calculated optical transmittance distribution. Thus, any variation in the illuminance distribution on the exposure surface caused by components constituting a lighting optical system is minimized.
Inventors:
KAWASHIMA HIRONORI (JP)
Application Number:
PCT/JP2017/020885
Publication Date:
January 04, 2018
Filing Date:
June 05, 2017
Export Citation:
Assignee:
V TECH CO LTD (JP)
International Classes:
G03F7/20; G02B21/06
Foreign References:
| JP2002305137A | 2002-10-18 | |||
| JP2009260337A | 2009-11-05 | |||
| JP2006210553A | 2006-08-10 | |||
| JP2004055856A | 2004-02-19 | |||
| JP2002237442A | 2002-08-23 | |||
| JP2001267205A | 2001-09-28 | |||
| JPH0922869A | 1997-01-21 | |||
| JPH07130600A | 1995-05-19 | |||
| JPS6442821A | 1989-02-15 |
Attorney, Agent or Firm:
EIKOH PATENT FIRM, P.C. (JP)
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