Title:
METHOD FOR MANUFACTURING LIGHT-ABSORBING SUBSTRATE AND METHOD FOR MANUFACTURING DIE FOR MANUFACTURING LIGHT-ABSORBING SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2012/014723
Kind Code:
A1
Abstract:
Disclosed is a method for manufacturing a light-absorbing substrate that has projections and recesses on the surface thereof. Said method includes: a first step in which a substrate is irradiated with laser light, thereby forming a plurality of modified regions inside the substrate in a two-dimensional array parallel to the surface of the substrate, and the modified regions and/or cracks emanating from the modified regions are made to reach the surface of the substrate; and a second step, after the first step, in which the surface of the substrate is etched to form projections and recesses on the surface of the substrate.
Inventors:
SHIMOI Hideki (1126-1 Ichino-cho, Higashi-ku, Hamamatsu-sh, Shizuoka 58, 〒4358558, JP)
下井 英樹 (〒58 静岡県浜松市東区市野町１１２６番地の１ 浜松ホトニクス株式会社内 Shizuoka, 〒4358558, JP)
下井 英樹 (〒58 静岡県浜松市東区市野町１１２６番地の１ 浜松ホトニクス株式会社内 Shizuoka, 〒4358558, JP)
Application Number:
JP2011/066358
Publication Date:
February 02, 2012
Filing Date:
July 19, 2011
Export Citation:
Assignee:
HAMAMATSU PHOTONICS K.K. (1126-1, Ichino-cho Higashi-ku, Hamamatsu-sh, Shizuoka 58, 〒4358558, JP)
浜松ホトニクス株式会社 (〒58 静岡県浜松市東区市野町１１２６番地の１ Shizuoka, 〒4358558, JP)
SHIMOI Hideki (1126-1 Ichino-cho, Higashi-ku, Hamamatsu-sh, Shizuoka 58, 〒4358558, JP)
浜松ホトニクス株式会社 (〒58 静岡県浜松市東区市野町１１２６番地の１ Shizuoka, 〒4358558, JP)
SHIMOI Hideki (1126-1 Ichino-cho, Higashi-ku, Hamamatsu-sh, Shizuoka 58, 〒4358558, JP)
International Classes:
H01L31/04
Attorney, Agent or Firm:
HASEGAWA Yoshiki et al. (SOEI PATENT AND LAW FIRM, Marunouchi MY PLAZA 9th fl. 1-1, Marunouchi 2-chome, Chiyoda-k, Tokyo 05, 〒1000005, JP)
Claims: