Title:
METHOD FOR MANUFACTURING MAGNETIC TUNNEL JUNCTION
Document Type and Number:
WIPO Patent Application WO/2020/087917
Kind Code:
A1
Abstract:
Provided is a method for manufacturing a magnetic tunnel junction, employing an etching device that comprises: a sample loading chamber (15), a vacuum transition chamber (14), a reactive-ion plasma etching chamber (10), an ion beam etching chamber (11), a coating chamber (12), and a vacuum delivery chamber (13). Under the constant application of a vacuum, the reactive-ion plasma etching chamber (10), the ion beam etching chamber (11), and the coating chamber (12) are used together to perform steps of ion beam etching (S13), reactive ion cleaning (S14), and applying a protective coating (S15). The above method can effectively reduce device damage and contamination, avoid effects of overetching, and improve device performance. Meanwhile, the steepness of an etching pattern can be precisely controlled, so as to obtain pattern results satisfying performance requirements.
Inventors:
CHE DONGCHEN (CN)
LIU ZIMING (CN)
JIANG ZHONGYUAN (CN)
WANG JUEBIN (CN)
CUI HUSHAN (CN)
HU DONGDONG (CN)
CHEN LU (CN)
ZOU ZHIWEN (CN)
SUN HONGYUE (CN)
XU KAIDONG (CN)
LIU ZIMING (CN)
JIANG ZHONGYUAN (CN)
WANG JUEBIN (CN)
CUI HUSHAN (CN)
HU DONGDONG (CN)
CHEN LU (CN)
ZOU ZHIWEN (CN)
SUN HONGYUE (CN)
XU KAIDONG (CN)
Application Number:
PCT/CN2019/088154
Publication Date:
May 07, 2020
Filing Date:
May 23, 2019
Export Citation:
Assignee:
JIANGSU LEUVEN INSTRUMMENTS CO LTD (CN)
International Classes:
H01L43/12
Foreign References:
| CN106676532A | 2017-05-17 | |||
| CN107623014A | 2018-01-23 | |||
| CN107658324A | 2018-02-02 | |||
| CN108242503A | 2018-07-03 | |||
| US20170033282A1 | 2017-02-02 |
Attorney, Agent or Firm:
BEIJING TRUSTED INTELLECTUAL PROPERTY AGENCY LTD et al. (CN)
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