Title:
METHOD FOR MANUFACTURING MAGNETORESISTANCE ELEMENT
Document Type and Number:
WIPO Patent Application WO/1998/044521
Kind Code:
A1
Abstract:
A method of manufacturing a magnetoresistance element which can reproduce magnetic signals with higher sensitivity. The manufacturing method includes the steps of providing a vacuum below 10?-9� Torr in a film forming chamber for forming a nonmagnetic layer and ferromagnetic layer; performing plasma-etching of the surface of a substrate by using a mixture of a gas (a) containing at least oxygen or water introduced into the chamber and an Ar gas (b) introduced into the chamber introduced into the chamber in a vacuum state controlled to higher than 10?-9� Torr; and forming the nonmagnetic and ferromagnetic layers on the etched substrate by sputtering a prescribed target by using the mixture of the gases (a) and (b).
Inventors:
TAKAHASHI MIGAKU (JP)
MIURA SATOSHI (JP)
TSUNODA MASAKIYO (JP)
MIURA SATOSHI (JP)
TSUNODA MASAKIYO (JP)
Application Number:
PCT/JP1997/001091
Publication Date:
October 08, 1998
Filing Date:
March 28, 1997
Export Citation:
Assignee:
TAKAHASHI MIGAKU (JP)
MIURA SATOSHI (JP)
TSUNODA MASAKIYO (JP)
MIURA SATOSHI (JP)
TSUNODA MASAKIYO (JP)
International Classes:
H01F41/18; H01F41/30; H01L43/12; (IPC1-7): H01F41/18; H01L43/12
Foreign References:
| JPH05234754A | 1993-09-10 | |||
| JPH06244028A | 1994-09-02 |
Other References:
See also references of EP 0971380A4
Attorney, Agent or Firm:
Fukumori, Hisao (5-11 Kudanminami 4-chom, Chiyoda-ku Tokyo 102, JP)
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