Title:
METHOD FOR MANUFACTURING MAGNETORESISTIVE EFFECT ELEMENT
Document Type and Number:
WIPO Patent Application WO/2014/080782
Kind Code:
A1
Abstract:
Provided is a method for manufacturing a magnetoresistive effect element, the method comprising efficiently removing noble metal atoms in a reattachment film attached to a lateral wall after element isolation to thereby prevent a short-circuit due to the reattachment film. The noble metal atoms are selectively removed from the reattachment film by irradiating the reattachment film formed on the lateral wall of the magnetoresistive effect element after the element isolation with an ion beam generated by using a plasma of Kr gas or Xe gas.
Inventors:
NAKAGAWA YUKITO (JP)
KODAIRA YOSHIMITSU (JP)
KURITA MOTOZO (JP)
NAKAGAWA TAKASHI (JP)
KODAIRA YOSHIMITSU (JP)
KURITA MOTOZO (JP)
NAKAGAWA TAKASHI (JP)
Application Number:
PCT/JP2013/080374
Publication Date:
May 30, 2014
Filing Date:
November 11, 2013
Export Citation:
Assignee:
CANON ANELVA CORP (JP)
International Classes:
H01L43/12; H01J37/305; H01L21/302; H01L21/8246; H01L27/105; H01L43/08
Foreign References:
| JP2003078184A | 2003-03-14 | |||
| JPH11330589A | 1999-11-30 | |||
| JP2011166157A | 2011-08-25 | |||
| JP2013069788A | 2013-04-18 |
Attorney, Agent or Firm:
WATANABE Keisuke et al. (JP)
Keisuke Watanabe (JP)
Keisuke Watanabe (JP)
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