Title:
METHOD FOR MANUFACTURING A MASTER PLATE, METHOD FOR MANUFACTURING AN ORIENTED FILM, METHOD FOR MANUFACTURING A RETARDATION PLATE, AND METHOD FOR MANUFACTURING A DISPLAY DEVICE
Document Type and Number:
WIPO Patent Application WO/2012/008326
Kind Code:
A1
Abstract:
Disclosed are: a method for manufacturing an oriented film whereby a non-oriented thin-film layer can be omitted; a method for manufacturing a master plate that can be used in the manufacture of such an oriented film; a method for manufacturing a retardation plate using such an oriented film; and a method for manufacturing a display device provided with a retardation plate using such an oriented film. A mold (210) is irradiated and scanned by femtosecond laser light with a fluence of 0.04-0.12 J/cm², a repetition frequency of 1000 Hz, and a wavelength of 800 nm. Since this forms a mold (210) that is textured with a pitch of at most half the wavelength of the laser light (i.e., at most 400 nm), said mold (210) can be used to manufacture a substrate (11) (oriented film) that is textured with a pitch of at most half the wavelength of the laser light (i.e., at most 400 nm).
Inventors:
HOSHI Mitsunari (1-7-1 Konan, Minato-k, Tokyo 75, 〒1080075, JP)
Application Number:
JP2011/065318
Publication Date:
January 19, 2012
Filing Date:
July 05, 2011
Export Citation:
Assignee:
SONY CORPORATION (1-7-1, Konan Minato-k, Tokyo 75, 〒1080075, JP)
ソニー株式会社 (〒75 東京都港区港南１丁目７番１号 Tokyo, 〒1080075, JP)
ソニー株式会社 (〒75 東京都港区港南１丁目７番１号 Tokyo, 〒1080075, JP)
International Classes:
G02B5/30; B23K26/00; B23K26/06; G02F1/13363; G02F1/1337
Attorney, Agent or Firm:
FUJISHIMA Youichiro et al. (3F Sawada Building, 15-9 Shinjuku 1-chome, Shinjuku-k, Tokyo 22, 〒1600022, JP)
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Claims: