Title:
METHOD FOR MANUFACTURING MATRIX
Document Type and Number:
WIPO Patent Application WO/2017/030151
Kind Code:
A1
Abstract:
A method for manufacturing a matrix having an uneven pattern includes the steps of: supplying a photocuring material onto a high-refractive-index medium 130 and forming a photocuring material film 210; and radiating a plurality of luminous fluxes 330, 370, 390 at mutually different incidence directions and an incidence angle equal to or greater than a critical angle from the high-refractive-index medium 130 to a predetermined region of an interface 230 of the photocuring material film 210 with the high-refractive-index medium 130, and, through use of a multi-beam interference evanescent wave thereby generated, curing the photocuring material film 210 in the vicinity of the predetermined region. Provided is a novel method for manufacturing a matrix for forming an uneven pattern in a mold used for nanoimprinting.
Inventors:
TAKAHASHI SATORU (JP)
SUZUKI YUKI (JP)
SUZUKI KUNIKAZU (JP)
MICHIHATA MASAKI (JP)
TAKAMASU KIYOSHI (JP)
TANAKA HIRONAO (JP)
NISHIMURA SUZUSHI (JP)
SUZUKI YUKI (JP)
SUZUKI KUNIKAZU (JP)
MICHIHATA MASAKI (JP)
TAKAMASU KIYOSHI (JP)
TANAKA HIRONAO (JP)
NISHIMURA SUZUSHI (JP)
Application Number:
PCT/JP2016/074037
Publication Date:
February 23, 2017
Filing Date:
August 17, 2016
Export Citation:
Assignee:
UNIV TOKYO (JP)
JX NIPPON OIL & ENERGY CORP (JP)
JX NIPPON OIL & ENERGY CORP (JP)
International Classes:
B29C33/38; B29C59/02; G03F7/20
Foreign References:
| JP2011526069A | 2011-09-29 | |||
| JP2007112021A | 2007-05-10 | |||
| JP2005238650A | 2005-09-08 | |||
| US20020102475A1 | 2002-08-01 |
Attorney, Agent or Firm:
KAWAKITA, Kijuro (JP)
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