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Patent Searching and Data


Title:
METHOD FOR MANUFACTURING METHYL FLUORIDE
Document Type and Number:
WIPO Patent Application WO/2015/020155
Kind Code:
A1
Abstract:
 The purpose of the present invention is to provide a method for manufacturing methyl fluoride useful as a dry etching gas or the like, as a method more suitable for commercial production. As a solution thereof, provided is a method for manufacturing methyl fluoride (CH3F) by reacting in a liquid phase (A) dimethyl sulfuric acid, and (B) at least one type selected from the group consisting of hydrogen fluoride and hydrofluoric acid salt, or a fluoride metal salt as a fluoride compound, the method being characterized in that the reaction is carried out without a solvent or using a polar solvent as the solvent when the fluoride compound (B) contains hydrogen fluoride or hydrofluoric acid salt, and the reaction is carried out using water as the solvent when the fluoride compound (B) is a fluoride metal salt.

Inventors:
NAKAMURA SHINGO
FUKUMOTO KANAKO
ETOU YUUSUKE
OHTSUKA TATSUYA
HIGASHI MASAHIRO
Application Number:
PCT/JP2014/070906
Publication Date:
February 12, 2015
Filing Date:
August 07, 2014
Export Citation:
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Assignee:
DAIKIN IND LTD (JP)
International Classes:
C07C17/093; C07C19/08
Foreign References:
JP2012201666A2012-10-22
JPS62501974A1987-08-06
Other References:
ORGANIC SYNTHESES, vol. 2, 1943, pages 399
KENNETH P. YATES ET AL.: "The Infra-Red Spectrum of Methyl Fluoride", PHYS. REV., vol. 71, no. 6, 1947, pages 349 - 360
Attorney, Agent or Firm:
SAEGUSA & PARTNERS (JP)
Patent business corporation 3 Edakuni [Hajime] patent firm (JP)
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