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Title:
METHOD FOR MANUFACTURING MICRO ELECTRO MECHANICAL SYSTEM DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/224513
Kind Code:
A1
Abstract:
A method for manufacturing a micro electro mechanical system (MEMS) device, comprising: providing a substrate (100), forming a first sacrificial layer (200) on a front surface of the substrate (100), and forming a functional structure (300) on the first sacrificial layer (200); etching a back surface of the substrate (100) to form grooves (110), wherein the etching stops at the first sacrificial layer (200), the grooves (110) communicate with each other and form a closed pattern, and the part of the substrate (100) surrounded by the grooves (110) is used as a support structure (120); and etching the first sacrificial layer (200), wherein the support structure (120) falls off as the first sacrificial layer (200) in contact with the support structure (120) is etched off, thus forming a back cavity (130). Supported by the support structure, the film layer above the grooves has a strong ability to bear the stress, ensuring that the film layer will not be deformed or broken during subsequent processes such as conveying and cleaning, and improving product yield. A small area of the grooves may help save the etching cost and etching time, a conveying device is facilitated to clamp devices conveniently, and automatic equipment can be used, thereby improving the production efficiency.

Inventors:
HU YONGGANG (CN)
ZHOU GUOPING (CN)
XIA CHANGFENG (CN)
Application Number:
PCT/CN2020/087987
Publication Date:
November 12, 2020
Filing Date:
April 30, 2020
Export Citation:
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Assignee:
CSMC TECHNOLOGIES FAB2 CO LTD (CN)
International Classes:
B81C1/00; H04R19/04; H04R31/00
Foreign References:
CN109385614A2019-02-26
TW201838908A2018-11-01
CN103281661A2013-09-04
CN101588529A2009-11-25
JP2010103701A2010-05-06
US20170210615A12017-07-27
US5888845A1999-03-30
Attorney, Agent or Firm:
ADVANCE CHINA IP LAW OFFICE (CN)
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