Title:
METHOD FOR MANUFACTURING NANO WIRE GRID POLARIZER
Document Type and Number:
WIPO Patent Application WO/2019/006800
Kind Code:
A1
Abstract:
A method for manufacturing a nano wire grid polarizer comprises the steps of: S1, laminating a first wire grid material layer (12a), a second wire grid material layer (13a) and a third wire grid material layer (14a) on a substrate (11) sequentially; S2, forming a nano photoresist array (21) on the third wire grid material layer (14a); S3, etching a part of the third wire grid material layer (14a) not shielded by the nano photoresist array (21) using a dry-etching technique; S4, etching a part of the second wire grid material layer (13a) not shielded by the nano photoresist array (21) using a wet-etching technique; S5, etching a part of the first wire grid material layer (12a) not shielded by the nano photoresist array (21) using a dry-etching technique; and S6, removing the nano photoresist array (21) to obtain a nano wire grid polarizer. By using the above manufacturing method, a multi-layer wire grid material film having a "sandwich" structure is manufactured on a substrate (1) by means of using a dry-etching technique and a wet-etching technique in different phases depending on different characteristics of different film materials, such that the thickness required to reach by a single etching process is reduced, and thus the defects of a single dry-etching technique and a single wet-etching technique are avoided and the process is simple.
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Inventors:
HOU JUN (CN)
CHEN LIXUAN (CN)
CHEN HSIAO HSIEN (CN)
CHEN LIXUAN (CN)
CHEN HSIAO HSIEN (CN)
Application Number:
PCT/CN2017/095044
Publication Date:
January 10, 2019
Filing Date:
July 28, 2017
Export Citation:
Assignee:
SHENZHEN CHINA STAR OPTOELECT (CN)
International Classes:
G02B5/30
Foreign References:
| CN1576907A | 2005-02-09 | |||
| CN101073024A | 2007-11-14 | |||
| CN103197368A | 2013-07-10 | |||
| CN201387494Y | 2010-01-20 | |||
| CN101688938A | 2010-03-31 | |||
| US20020122235A1 | 2002-09-05 |
Attorney, Agent or Firm:
MING & YUE INTELLECTUAL PROPERTY LAW FIRM (CN)
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