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Title:
METHOD FOR MANUFACTURING NICKEL AND COBALT-CONTAINING SOLUTION FROM HYDROXIDE CONTAINING NICKEL AND COBALT
Document Type and Number:
WIPO Patent Application WO/2020/196046
Kind Code:
A1
Abstract:
Provided is a method for manufacturing, from a hydroxide, a high purity solution that comprises both cobalt and nickel for which the manufacturing costs are effectively reduced. The method for manufacturing a cobalt and nickel-containing solution includes: a rinsing step of using, as a starting material, at least one of a crude nickel hydroxide containing cobalt, nickel, and elements other than the cobalt and nickel as impurities, wherein the amount of the nickel is greater than that of the cobalt, or a crude cobalt hydroxide wherein the amount of the cobalt is greater than that of the nickel, to obtain a post-rinse crude hydroxide from the starting material; a leaching step of obtaining a post-leaching liquid from the post-rinse crude hydroxide; a neutralization step of subjecting the post-leaching liquid to neutralization and solid-liquid separation and removing a post-neutralization residue containing one or more of iron, silicon, aluminum, and chrome, which are impurities, to obtain a post-neutralization liquid; and an extraction step of subjecting the post-neutralization liquid to solvent extraction to obtain a post-extraction liquid that contains both cobalt and nickel and has reduced impurities.

Inventors:
OHARA HIDEKI (JP)
SANJO SHOTA (JP)
TAKANO MASATOSHI (JP)
ASANO SATOSHI (JP)
KOBAYASHI HIROSHI (JP)
SENBA YUSUKE (JP)
WATANABE HIROTO (JP)
Application Number:
PCT/JP2020/011512
Publication Date:
October 01, 2020
Filing Date:
March 16, 2020
Export Citation:
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Assignee:
SUMITOMO METAL MINING CO (JP)
International Classes:
B01D11/04; C01G53/00; C22B3/06; C22B3/22; C22B3/26; C22B3/38; C22B3/44; C22B23/00
Domestic Patent References:
WO2018076993A12018-05-03
Foreign References:
JP2017226559A2017-12-28
JP2014156649A2014-08-28
JP2011195920A2011-10-06
Other References:
See also references of EP 3950085A4
Attorney, Agent or Firm:
OSHIDA Yoshitaka (JP)
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