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Patent Searching and Data


Title:
METHOD OF MANUFACTURING OBJECT WITH LOW REFLECTION FILM
Document Type and Number:
WIPO Patent Application WO/2013/051620
Kind Code:
A1
Abstract:
Provided is a method of manufacturing an object with a low reflection film, with which it is possible to form a low reflection film with which it is possible to handle a wide substrate, have a comparatively rapid speed of conveyance of the substrate, a comparatively low volume of required coating compound, a comparatively short time for drying, firing, and/or application, and a uniform thickness, as well as have superior thickness controllability whereby a low reflection film having thickness which is arbitrarily optically designable is easily formed. When forming, upon a substrate (2) which is conveyed in a prescribed direction, a low reflection film by applying a coating compound (20) by a coating roll (14) of a reverse roll coater (10), the rotation speed of the coating roll (14) is made slower than the conveyance speed of the substrate (2), and the coating compound (20) includes a dispersal medium (a), fine particles (b) which are dispersed in the dispersal medium (a), and a binder (c) which is either dissolved or dispersed in the dispersal medium (a), wherein the viscosity is 1-10mPa•s.

Inventors:
OTANI YOSHIMI (JP)
MOTOTANI SATOSHI (JP)
Application Number:
JP2012/075680
Publication Date:
April 11, 2013
Filing Date:
October 03, 2012
Export Citation:
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Assignee:
ASAHI GLASS CO LTD (JP)
International Classes:
B05D5/06; B05D1/28; C03C17/25; C09D7/12; C09D201/00
Domestic Patent References:
WO2010018852A12010-02-18
WO2011027827A12011-03-10
Foreign References:
JPH09294959A1997-11-18
JP2004200599A2004-07-15
JP2007260591A2007-10-11
JP2006128649A2006-05-18
JP2009268966A2009-11-19
JP2005037510A2005-02-10
Attorney, Agent or Firm:
SENMYO, Kenji et al. (JP)
Spring name Kenji (JP)
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Claims: