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Patent Searching and Data


Title:
METHOD FOR MANUFACTURING ORGANIC DEVICE, AND FILM FORMING DEVICE
Document Type and Number:
WIPO Patent Application WO/2018/135323
Kind Code:
A1
Abstract:
A method for manufacturing an organic device 10 of an embodiment has a film forming step for doing continuous film formation of first to Nth layers (where N is an integer of 2 or greater) on a first electrode layer 14 formed on a main surface 12a of a flexible substrate while a flexible substrate 12 is continuously conveyed, where at the film forming step, with the interposition of first to Nth shielding units placed between a first to Nth film forming source and the flexible substrate, by material of the first to Nth layers being supplied from the first to Nth film forming sources to the flexible substrate, film is formed on the first electrode layer in sequence of the first to Nth layers respectively, the first to Nth shielding units are fixed with respect to the conveyance direction of the flexible substrate in a state separated from the flexible substrate, and a shielding region using at least one shielding unit of the first to Nth shield units is different from a shielding region using another shielding unit.

Inventors:
MORISHIMA SHINICHI (JP)
KISHIKAWA EIJI (JP)
SHIMOGAWARA MASAYA (JP)
Application Number:
PCT/JP2018/000108
Publication Date:
July 26, 2018
Filing Date:
January 05, 2018
Export Citation:
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Assignee:
SUMITOMO CHEMICAL CO (JP)
International Classes:
H05B33/10; C23C14/04; C23C14/56; H01L51/48; H01L51/50; H05B33/02
Domestic Patent References:
WO2016158407A12016-10-06
WO2001005194A12001-01-18
WO2012008275A12012-01-19
Foreign References:
JP2014214367A2014-11-17
JP2013504693A2013-02-07
JP2012230816A2012-11-22
US20030230238A12003-12-18
Other References:
See also references of EP 3573430A4
Attorney, Agent or Firm:
HASEGAWA Yoshiki et al. (JP)
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