Title:
METHOD FOR MANUFACTURING PURIFIED QUATERNARY AMMONIUM COMPOUND AQUEOUS SOLUTION
Document Type and Number:
WIPO Patent Application WO/2023/166999
Kind Code:
A1
Abstract:
The present invention pertains to the development of a method whereby it is possible to maintain a high removal effect of metal ions from a crude quaternary ammonium compound (for example, a quaternary ammonium hydroxide compound or halogenated quaternary ammonium compound) aqueous solution having a low contained amount of organic impurities, even if the removal is continued for a large processing amount thereof. This method for manufacturing a purified quaternary ammonium compound aqueous solution uses a crude quaternary ammonium compound aqueous solution which contains metal impurities and in which the contained amount of organic impurities having a molecular weight per mole of at least 1000 is 1000 ppm or less, the method being characterized by bringing the crude quaternary ammonium compound aqueous solution into contact with a cation exchange resin having a degree of crosslinking of at least 8 and having counter ions which are non-metallic ions.
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Inventors:
MIZUTA KOTARO (JP)
KONISHI RYUNOSUKE (JP)
INOUE HIROSHI (JP)
KONISHI RYUNOSUKE (JP)
INOUE HIROSHI (JP)
Application Number:
PCT/JP2023/005436
Publication Date:
September 07, 2023
Filing Date:
February 16, 2023
Export Citation:
Assignee:
TOKUYAMA CORP (JP)
International Classes:
B01J39/05; C07C209/84; B01J39/20; B01J47/02; C02F1/42; C07C211/63
Foreign References:
| JPH03167160A | 1991-07-19 | |||
| JPH06173054A | 1994-06-21 | |||
| JP2000319233A | 2000-11-21 | |||
| JPH11190907A | 1999-07-13 | |||
| JP2007181833A | 2007-07-19 | |||
| JP2004512315A | 2004-04-22 |
Attorney, Agent or Firm:
ATAGO IP (JP)
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