Title:
METHOD FOR MANUFACTURING SAMPLE FOR THIN FILM PROPERTY MEASUREMENT AND ANALYSIS, AND SAMPLE MANUFACTURED THEREBY
Document Type and Number:
WIPO Patent Application WO/2018/034437
Kind Code:
A1
Abstract:
The present invention relates to a method for manufacturing a sample for thin film property measurement and analysis, and a sample manufactured thereby and, more specifically, to: a method for manufacturing a sample capable of measuring or analyzing various properties in one sample; and a sample manufactured thereby. According to the present invention, a method for manufacturing a sample for thin film property measurement and analysis: forms a first layer made of an insulation material on the front surface of a substrate; forms a second layer on the back surface of the substrate; patterns the second layer; etching the back surface of the substrate by using the patterned second layer as a mask so as to form a through hole penetrating through the front surface and the back surface of the substrate, thereby exposing at least one part of the surface of the first layer facing the substrate; partially etches the exposed part of the first layer through the back surface of the substrate; and forms the thin film, to be measured and analyzed, on a surface opposite the surface of the first layer facing the substrate.
Inventors:
KIM KI BUM (KR)
KIM MIN SIK (KR)
KIM HYUN MI (KR)
KIM KI JU (KR)
KIM MIN SIK (KR)
KIM HYUN MI (KR)
KIM KI JU (KR)
Application Number:
PCT/KR2017/007879
Publication Date:
February 22, 2018
Filing Date:
July 21, 2017
Export Citation:
Assignee:
SEOUL NAT UNIV R&DB FOUNDATION (KR)
International Classes:
G01N1/28; G01N1/36; H01L21/033; H01L21/205; H01L21/306; H01L21/66; H01L29/16
Foreign References:
| KR20140021245A | 2014-02-20 | |||
| KR20130019699A | 2013-02-27 | |||
| JP2012252004A | 2012-12-20 | |||
| JP2006105985A | 2006-04-20 | |||
| JP2003533676A | 2003-11-11 |
Attorney, Agent or Firm:
YOO, Jong Woo (KR)
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