Title:
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE TREATING APPARATUS, AND RECORDING MEDIUM
Document Type and Number:
WIPO Patent Application WO/2020/188743
Kind Code:
A1
Abstract:
Provided is technology that performs: (a) a step for heating a substrate holder having multiple levels of slots for housing substrates inside a reaction chamber; (b) a step for repeatedly performing a set that includes a step of moving the substrate holder so as to position a portion of the slots among a plurality of slots outside the reaction chamber, and a step of loading substrates in a portion of the slots; and (c) a step for moving the substrate holder so that substrates loaded in the plurality of slots are housed within the reaction chamber.
Inventors:
YAMAGUCHI TAKATOMO (JP)
YOSHIDA HIDENARI (JP)
ONO KENJI (JP)
YOSHIDA HIDENARI (JP)
ONO KENJI (JP)
Application Number:
PCT/JP2019/011456
Publication Date:
September 24, 2020
Filing Date:
March 19, 2019
Export Citation:
Assignee:
KOKUSAI ELECTRIC CORP (JP)
International Classes:
H01L21/677
Foreign References:
| JP2015526594A | 2015-09-10 | |||
| JP2016540372A | 2016-12-22 | |||
| JP2007311724A | 2007-11-29 | |||
| JP2018014469A | 2018-01-25 | |||
| JPH10335426A | 1998-12-18 | |||
| JP2016516293A | 2016-06-02 |
Attorney, Agent or Firm:
FUKUOKA Masahiro et al. (JP)
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