Title:
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE
Document Type and Number:
WIPO Patent Application WO/2015/008387
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing a method for manufacturing an SGT and providing a structure of an SGT obtained as a result of the method, the SGT having a structure in which the upper portion of a self-aligned pillar-shaped semiconductor layer is made to function as an n-type semiconductor layer or a p-type semiconductor layer depending on the work-function difference between a metal and a semiconductor, the method being a gate-last process in which a fin-shaped semiconductor layer, a pillar-shaped semiconductor layer, a gate electrode, and gate wiring are formed using two masks. The present invention resolves the problem by being characterized in having a sixth step for: depositing a second gate insulating film around a pillar-shaped semiconductor layer as well as on the gate electrode and the gate wiring; removing the second gate insulating film on a part of the gate wiring; depositing a second metal; performing etch-back; removing the second gate insulating film on the pillar-shaped semiconductor layer; depositing a third metal; and etching a part of the third metal and the second metal to form a first contact in which the second metal surrounds the side wall of the upper portion of the pillar-shaped semiconductor layer, a second contact connecting the upper portion of the first contact and the upper portion of the pillar-shaped semiconductor layer, and a third contact comprising the second metal formed on the gate wiring and the third metal.
Inventors:
MASUOKA FUJIO (JP)
NAKAMURA HIROKI (JP)
NAKAMURA HIROKI (JP)
Application Number:
PCT/JP2013/069666
Publication Date:
January 22, 2015
Filing Date:
July 19, 2013
Export Citation:
Assignee:
UNISANTIS ELECT SINGAPORE PTE (SG)
MASUOKA FUJIO (JP)
NAKAMURA HIROKI (JP)
MASUOKA FUJIO (JP)
NAKAMURA HIROKI (JP)
International Classes:
H01L21/336; H01L29/78
Domestic Patent References:
| WO2013093988A1 | 2013-06-27 | |||
| WO2013080378A1 | 2013-06-06 | |||
| WO2013069102A1 | 2013-05-16 | |||
| WO2009110050A1 | 2009-09-11 |
Attorney, Agent or Firm:
TSUJII Koichi et al. (JP)
辻居 Koichi (JP)
辻居 Koichi (JP)
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