Title:
METHOD FOR MANUFACTURING SOLAR CELL
Document Type and Number:
WIPO Patent Application WO/2019/138613
Kind Code:
A1
Abstract:
The present invention is for efficiently manufacturing a back-contact solar cell. A manufacturing method for a solar cell 10 that includes a crystal substrate 11 includes first through fifth steps. In the second step, a first lift-off layer LF1 and a second lift-off layer LF2 are formed on a p-type semiconductor layer 13p so as to be layered in that order. In the fourth step, an n-type semiconductor layer 13n is formed layered onto the second lift-off layer LF2 remaining after the third step and onto a non-formation region where no p-type semiconductor layer 13p has been formed. In the fifth step, a first etching solution is used to remove the first lift-off layer LF1 and the second lift-off layer LF2 so that the n-type semiconductor layer 13n layered onto the second lift-off layer LF2 is also removed. The etching speeds of the p-type semiconductor layer 13p, the first lift-off layer LF1, and the second lift-off layer LF2 by the first etching solution fulfil a specific relational expression.
Inventors:
MISHIMA RYOTA (JP)
ADACHI DAISUKE (JP)
ADACHI DAISUKE (JP)
Application Number:
PCT/JP2018/036419
Publication Date:
July 18, 2019
Filing Date:
September 28, 2018
Export Citation:
Assignee:
KANEKA CORP (JP)
International Classes:
H01L31/0747; H01L21/306; H01L31/0224
Domestic Patent References:
| WO2015060432A1 | 2015-04-30 |
Foreign References:
| JP2010532817A | 2010-10-14 | |||
| JP2013120863A | 2013-06-17 | |||
| US6156665A | 2000-12-05 |
Attorney, Agent or Firm:
NIIYAMA Yuichi (JP)
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