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Title:
METHOD FOR MANUFACTURING SUBSTRATE AND METHOD FOR MANUFACTURING LIGHT EMITTING ELEMENT USING SAME
Document Type and Number:
WIPO Patent Application WO/2017/073674
Kind Code:
A1
Abstract:
The present invention provides a method for manufacturing a substrate with a curved pattern engraved on the surface, in the method: a resist pattern can be formed in a curved shape; resist burning or carbonization does not occur even in high-output dry etching processing in which high temperatures are reached; and used is a resin composition capable of providing a cured film having a good etching selectivity and removability after etching. The present invention provides a method for manufacturing a patterned substrate, the method comprising: a step of providing, on a substrate, a coating of a resin composition including (A) an alkali-soluble resin selected from the group consisting of polyimides, polyamideimides, polyimide precursors, polyamideimide precursors, polybenzoxazoles, and polybenzoxazole precursors, copolymers of at least two of said resins and copolymers of at least one of said resins and another structural unit; (B) a photoacid generator, and (C) at least one compound selected from the group consisting of an epoxy compound and an oxetane compound; a step of forming a pattern of the coating; a step of patterning the substrate by etching with the pattern of the coating as a mask; and a step of removing the coating of the resin composition.

Inventors:
KOBAYASHI HIDEYUKI (JP)
YUBA TOMOYUKI (JP)
Application Number:
PCT/JP2016/081898
Publication Date:
May 04, 2017
Filing Date:
October 27, 2016
Export Citation:
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Assignee:
TORAY INDUSTRIES (JP)
International Classes:
C08L79/08; C08G65/18; C08K5/1525; C08L63/00; C08L79/04; G03F7/004; G03F7/023; G03F7/075; G03F7/20; G03F7/40
Foreign References:
JP2014170080A2014-09-18
JP2014191002A2014-10-06
JP2014163999A2014-09-08
JP2007106779A2007-04-26
JP2008083467A2008-04-10
JP2008107512A2008-05-08
Other References:
See also references of EP 3369780A4
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