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Title:
METHOD FOR MANUFACTURING SUBSTRATE WITH MULTILAYER REFLECTIVE FILM
Document Type and Number:
WIPO Patent Application WO/2014/050831
Kind Code:
A1
Abstract:
With the objective of providing a substrate with a multilayer reflective film and a method of manufacturing same or the like in which few false defects are detected even when using a high-sensitivity defect-inspection device using various wavelengths of light, in which is achieved the smoothness required in particular for a substrate with a multilayer reflective film, and simultaneously capable of effectively detecting critical defects since few false defects are detected, the present invention relates to a method for manufacturing a substrate with a multilayer reflective film in which spatter particles are caused to be incident at an incidence angle of 0 ° to no more than 30°, using ion-beam spattering, on a multilayer reflective film in which are alternately stacked a high-refractive-index layer and a low-refractive-index layer, the power spectral density in a prescribed spatial frequency domain reaching a prescribed value.

Inventors:
ORIHARA TOSHIHIKO (JP)
HAMAMOTO KAZUHIRO (JP)
KOZAKAI HIROFUMI (JP)
SHOKI TSUTOMU (JP)
HORIKAWA JUNICHI (JP)
Application Number:
PCT/JP2013/075754
Publication Date:
April 03, 2014
Filing Date:
September 24, 2013
Export Citation:
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Assignee:
HOYA CORP (JP)
International Classes:
G03F1/24; H01L21/027
Domestic Patent References:
WO2010061828A12010-06-03
Foreign References:
JP2004246366A2004-09-02
JP2009510711A2009-03-12
JP2007073949A2007-03-22
JP2004289110A2004-10-14
JP2009272317A2009-11-19
Attorney, Agent or Firm:
TSUKUNI & ASSOCIATES et al. (JP)
Patent business corporation Tsukuni (JP)
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