Title:
METHOD OF MANUFACTURING TFT USING PHOTOSENSITIVE APPLYING-TYPE ELECTRODE MATERIAL
Document Type and Number:
WIPO Patent Application WO/2012/008203
Kind Code:
A1
Abstract:
Conventional electrode forming methods such as photolithography or mask sputtering had problems difficult to solve, such as simplification of the process, efficiency in the use of materials, cost, and being adaptable to various substrate sizes, and ink-jet methods had a problem in that high definition patterns could not be attained. A desired electrode patterning is achieved by using a photosensitive applying-type electrode material. In an electrode forming process of the present invention, the desired pattern can be obtained by implementing a first exposure and a second exposure having an amount of exposure greater than the first exposure, using a lamp having diffused light as the light source thereof, which is advantageous in cost. Problems that could not be solved by conventional manufacturing methods of TFT, such as efficiency in the use of materials, cost, and being adaptable to various substrate sizes, for examples, and a problem that could not be solved by the ink-jet methods in that high definition patterns could not be attained, are solved by implementing a twice-exposure process using diffused light.
Inventors:
SUGINOYA, Mitsuru (8 Nakase 1-chome, Mihama-ku, Chiba-sh, Chiba 07, 〒2618507, JP)
杉野谷 充 (〒07 千葉県千葉市美浜区中瀬１丁目８番地 セイコーインスツル株式会社内 Chiba, 〒2618507, JP)
KOBAYASHI, Tomoatsu (8 Nakase 1-chome, Mihama-ku, Chiba-sh, Chiba 07, 〒2618507, JP)
杉野谷 充 (〒07 千葉県千葉市美浜区中瀬１丁目８番地 セイコーインスツル株式会社内 Chiba, 〒2618507, JP)
KOBAYASHI, Tomoatsu (8 Nakase 1-chome, Mihama-ku, Chiba-sh, Chiba 07, 〒2618507, JP)
Application Number:
JP2011/060263
Publication Date:
January 19, 2012
Filing Date:
April 27, 2011
Export Citation:
Assignee:
SEIKO INSTRUMENTS INC. (8 Nakase 1-chome, Mihama-ku Chiba-sh, Chiba 07, 〒2618507, JP)
セイコーインスツル株式会社 (〒07 千葉県千葉市美浜区中瀬１丁目８番地 Chiba, 〒2618507, JP)
SUGINOYA, Mitsuru (8 Nakase 1-chome, Mihama-ku, Chiba-sh, Chiba 07, 〒2618507, JP)
杉野谷 充 (〒07 千葉県千葉市美浜区中瀬１丁目８番地 セイコーインスツル株式会社内 Chiba, 〒2618507, JP)
セイコーインスツル株式会社 (〒07 千葉県千葉市美浜区中瀬１丁目８番地 Chiba, 〒2618507, JP)
SUGINOYA, Mitsuru (8 Nakase 1-chome, Mihama-ku, Chiba-sh, Chiba 07, 〒2618507, JP)
杉野谷 充 (〒07 千葉県千葉市美浜区中瀬１丁目８番地 セイコーインスツル株式会社内 Chiba, 〒2618507, JP)
International Classes:
H01L21/336; H01L21/28; H01L21/288; H01L21/3205; H01L29/417; H01L29/786; H01L51/50
Attorney, Agent or Firm:
KUHARA, Kentaro et al. (8 Nakase 1-chome, Mihama-ku, Chiba-sh, Chiba 07, 〒2618507, JP)
Claims: