Title:
METHOD FOR MANUFACTURING THIN FILM
Document Type and Number:
WIPO Patent Application WO/2014/204028
Kind Code:
A1
Abstract:
The present invention includes the steps of: preparing a substrate; preparing a raw material including organic silane having CxHy (here, 1≤x≤9, 4≤y≤20, Y>2X) as a functional group; vaporizing the raw material; loading the substrate to the inside of a chamber; and supplying the vaporized raw material into the chamber. Accordingly, the present invention can manufacture a thin film without degrading the film quality even at low temperatures, and can more reliably and stably manufacture a device for which a low-temperature process is required.
Inventors:
PARK SO YEON (KR)
KWON YOUNG SOO (KR)
KWON YOUNG SOO (KR)
Application Number:
PCT/KR2013/005375
Publication Date:
December 24, 2014
Filing Date:
June 18, 2013
Export Citation:
Assignee:
WONIK IPS CO LTD (KR)
International Classes:
H01L21/205; H01L21/31
Foreign References:
| KR20090036068A | 2009-04-13 | |||
| US20050020048A1 | 2005-01-27 | |||
| KR20080084593A | 2008-09-19 | |||
| KR20090040867A | 2009-04-27 | |||
| US20110256721A1 | 2011-10-20 |
Attorney, Agent or Firm:
NAM, SEUNG-HEE (KR)
남승희 (KR)
남승희 (KR)
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