Title:
METHOD OF MANUFACTURING A THIN SILICON-OXIDE LAYER
Document Type and Number:
WIPO Patent Application WO1996012050
Kind Code:
A1
Abstract:
A description is given of a method of providing an ultra-thin (< 1 nm) silicon-oxide layer on a substrate surface, for example, of a metal. A film of a solution of a polyorganosiloxane is applied to said substrate surface. After drying, said polyorganosiloxane is completely converted to said silicon-oxide layer by means of an UV-ozone treatment. Such an ultra-thin silicon-oxide layer sufficiently protects a metal surface against corrosion. In addition, said silicon-oxide layer can be silanized with the customary silane coupling agents to improve the bond with polymers. The method can very suitably be used, for example, to treat metal leadframes for ICs and to provide a bonding layer for indium tin oxide on polyacrylate for a passive plate of LC displays.
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Inventors:
KNOTTER DIRK MAARTEN
WIJDENES JACOB
WIJDENES JACOB
Application Number:
PCT/IB1995/000855
Publication Date:
April 25, 1996
Filing Date:
October 10, 1995
Export Citation:
Assignee:
PHILIPS ELECTRONICS NV (NL)
PHILIPS NORDEN AB (SE)
PHILIPS NORDEN AB (SE)
International Classes:
B05D3/06; B05D7/24; C23C18/12; H01L21/316; G02F1/1333; H01L23/31; H01L23/495; H01L23/50; (IPC1-7): C23C18/12; H01L21/316; G02F1/1333
Foreign References:
| US5336532A | 1994-08-09 | |||
| EP0462715A1 | 1991-12-27 | |||
| EP0313095A2 | 1989-04-26 | |||
| US4900582A | 1990-02-13 | |||
| EP0552131A1 | 1993-07-21 |
Other References:
DIALOG INFORMATION SERVICES, File 351, World Patent Index 81-96, Dialog accession no. 008002632, WPI accession no. 89-267744/37, SUMITOMO CHEM IND KK, "Forming Silica Coat Used as Insulating Membrane - in Which Soln. Contg. a Siloxanel is Coated on Substrate, UV Rays Irradiated on Coating etc."; & JP,A,01 194
LANGMUIR, THE ACS JOURNAL OF SURFACES AND COLLOIDS, Volume 11, No. 4, April 1995, C.L. MIRLEY et al., "A Room Temperature Method for the Preparation of Ultrathin SiOx Films from Langmuir-Blodgett Layers", page 1049 - page 1052.
LANGMUIR, THE ACS JOURNAL OF SURFACES AND COLLOIDS, Volume 11, No. 4, April 1995, C.L. MIRLEY et al., "A Room Temperature Method for the Preparation of Ultrathin SiOx Films from Langmuir-Blodgett Layers", page 1049 - page 1052.
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