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Title:
METHOD FOR MANUFACTURING TRANSPARENT CONDUCTIVE FILM
Document Type and Number:
WIPO Patent Application WO/1992/018990
Kind Code:
A1
Abstract:
A film forming method capable of forming a transparent conductive film whose surface has a texture structure by a sputtering method. By using a target (40) of an oxide, which has at least the composition of the objective film as its component, and by sputtering the target in a gas atmosphere containing OH, a transparent conductive film is formed on a base (50).

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Inventors:
NAKADA TOKIO (JP)
Application Number:
PCT/JP1992/000455
Publication Date:
October 29, 1992
Filing Date:
April 10, 1992
Export Citation:
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Assignee:
NAKADA TOKIO (JP)
International Classes:
C23C14/00; C23C14/08; (IPC1-7): H01B13/00
Foreign References:
JPH0238568A1990-02-07
JPS63181462A1988-07-26
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