Title:
METHOD FOR MANUFACTURING A TRANSPARENT CONDUCTIVE SUBSTRATE, TRANSPARENT CONDUCTIVE SUBSTRATE, AND ELECTROCHEMICAL DISPLAY ELEMENT
Document Type and Number:
WIPO Patent Application WO/2011/021470
Kind Code:
A1
Abstract:
Disclosed are: a method for manufacturing a highly reliable transparent conductive substrate, a transparent conductive substrate and an electrochemical display element, which combine high transparency and low resistance. The method includes the following steps: a step for forming a groove in the surface of a transparent insulator; a step for forming a metallic electrode film on the surface of the transparent insulator comprising the groove; a step for removing, by means of grinding, the metallic electrode film formed outside the groove; and a step for forming a transparent conductive film on the surface of the transparent insulator comprising the metallic electrode film formed inside the groove.
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Inventors:
MIYAI Mitsuyoshi (Inc. 1, Sakura-machi, Hino-sh, Tokyo 11, 〒1918511, JP)
Application Number:
JP2010/062326
Publication Date:
February 24, 2011
Filing Date:
July 22, 2010
Export Citation:
Assignee:
Konica Minolta Holdings, Inc. (6-1 Marunouchi 1-chome, Chiyoda-ku Tokyo, 05, 〒1000005, JP)
コニカミノルタホールディングス株式会社 (〒05 東京都千代田区丸の内一丁目６番１号 Tokyo, 〒1000005, JP)
コニカミノルタホールディングス株式会社 (〒05 東京都千代田区丸の内一丁目６番１号 Tokyo, 〒1000005, JP)
International Classes:
H01B13/00; B32B15/08; H01B5/14
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