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Title:
METHOD FOR MEASURING WAVEFRONT ABERRATION AND DEVICE OF SAME
Document Type and Number:
WIPO Patent Application WO/2011/114407
Kind Code:
A1
Abstract:
Since the pupil diameter of the objective lens used for a semiconductor inspection device or a laser machining device sometimes exceeds the field of view detected by a Shack-Hartmann sensor, the aberration of the whole pupil cannot be measured by a single image-pickup. In order to measure the aberration of the whole pupil, the large field of view is detected by scanning the Shack-Hartmann sensor.

Inventors:
HARIYAMA, Tatsuo (HITACHI LTD., 292 Yoshida-cho, Totsuka-ku, Yokohama-sh, Kanagawa 17, 〒2440817, JP)
針山 達雄 (〒17 神奈川県横浜市戸塚区吉田町292番地 株式会社日立製作所 生産技術研究所内 Kanagawa, 〒2440817, JP)
YOSHIDA, Minoru (HITACHI LTD., 292 Yoshida-cho, Totsuka-ku, Yokohama-sh, Kanagawa 17, 〒2440817, JP)
Application Number:
JP2010/007178
Publication Date:
September 22, 2011
Filing Date:
December 10, 2010
Export Citation:
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Assignee:
HITACHI, LTD. (6-6 Marunouchi 1-chome, Chiyoda-ku Tokyo, 80, 〒1008280, JP)
株式会社日立製作所 (〒80 東京都千代田区丸の内一丁目6番6号 Tokyo, 〒1008280, JP)
HARIYAMA, Tatsuo (HITACHI LTD., 292 Yoshida-cho, Totsuka-ku, Yokohama-sh, Kanagawa 17, 〒2440817, JP)
針山 達雄 (〒17 神奈川県横浜市戸塚区吉田町292番地 株式会社日立製作所 生産技術研究所内 Kanagawa, 〒2440817, JP)
International Classes:
G01M11/02; G01N21/84; H01L21/027; H01L21/66
Attorney, Agent or Firm:
INOUE, Manabu et al. (6-1, Marunouchi 1-chom, Chiyoda-ku Tokyo 20, 〒1008220, JP)
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Claims: