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Title:
METHOD OF OPERATING A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND PROJECTION OBJECTIVE OF SUCH AN APPARATUS
Document Type and Number:
WIPO Patent Application WO/2013/113336
Kind Code:
A9
Abstract:
A projection objective of a microlithographic projection ex- posure apparatus (10) has a wavefront correction device (42) comprising a first refractive optical element (44) and a sec¬ ond refractive optical element (54). The first refractive op- tical element comprises a first optical material having, for an operating wavelength of the apparatus, an index of refrac- tion that decreases with increasing temperature. The second refractive optical element comprises a second optical mate¬ rial having, for an operating wavelength of the apparatus, an index of refraction that increases with increasing tempera- ture. In a correction mode of the correction device (42), a first heating device (46; 146) produces a non-uniform and variable first temperature distribution in the first optical material, and a second heating device (56; 156) produces a non-uniform and variable second temperature distribution in the second optical material.

Inventors:
WALTER, Holger (Kolonie 20, Abtsgmünd, 73453, DE)
BITTNER, Boris (Rheingoldstrasse 6, Roth, 91154, DE)
Application Number:
EP2012/000508
Publication Date:
August 08, 2013
Filing Date:
February 04, 2012
Export Citation:
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Assignee:
CARL ZEISS SMT GMBH (Rudolf-Eber-Strasse 2, Oberkochen, 73447, DE)
WALTER, Holger (Kolonie 20, Abtsgmünd, 73453, DE)
BITTNER, Boris (Rheingoldstrasse 6, Roth, 91154, DE)
International Classes:
G03F7/20; G02B7/02; G02B27/00
Attorney, Agent or Firm:
SCHWANHÄUSSER, Gernot et al. (Ostertag & Partner, PatentanwälteEpplestr. 14, Stuttgart, 70597, DE)
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