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Title:
METHOD FOR OPERATING A PROJECTION EXPOSURE TOOL AND CONTROL APPARATUS
Document Type and Number:
WIPO Patent Application WO/2012/031765
Kind Code:
A3
Abstract:
A method for operating a projection exposure tool (10) for microlithography is provided. The projection exposure tool (10) comprises an optical system (24; 18) which comprises a number of optical elements (26) which, during an imaging process, convey electromagnetic radiation (16, 16a, 16b, 16c), all of the surfaces of the optical elements (26) interacting with the electromagnetic radiation (16) during the imaging process forming an overall optical surface of the optical system (24; 18). The method comprises the steps: determining respective individual thermal expansion coefficients (52) at at least two different locations of the overall optical surface, calculating a change to an optical property of the optical system (24; 18) brought about by heat emission of the electromagnetic radiation (16, 16a, 16b, 16c) during the imaging process upon the basis of the thermal expansion coefficients (52), and imaging mask structures into an image plane (34) by means of the projection exposure tool (10) with adaptation of the imaging characteristics of the projection exposure tool (10) such that the calculated change to the optical property is at least partially compensated.

Inventors:
GERHARD MICHAEL (DE)
DOERBRAND BERND (DE)
GRUNER TORALF (DE)
Application Number:
PCT/EP2011/004535
Publication Date:
May 31, 2012
Filing Date:
September 08, 2011
Export Citation:
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Assignee:
ZEISS CARL SMT GMBH (DE)
GERHARD MICHAEL (DE)
DOERBRAND BERND (DE)
GRUNER TORALF (DE)
International Classes:
G01B9/02; G03F7/20
Foreign References:
US5953106A1999-09-14
DE10351142A12004-05-27
US20070291243A12007-12-20
Attorney, Agent or Firm:
SUMMERER, Christian et al. (Nussbaumstr. 8, München, DE)
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