METHOD FOR ORGANIC SEMICONDUCTOR MATERIAL THIN FILM FORMATION AND PROCESS FOR PRODUCING ORGANIC THIN FILM TRANSISTOR

Title:

METHOD FOR ORGANIC SEMICONDUCTOR MATERIAL THIN FILM FORMATION AND PROCESS FOR PRODUCING ORGANIC THIN FILM TRANSISTOR

Document Type and Number:

WIPO Patent Application WO/2006/137233

Kind Code:

A1

Abstract:

This invention provides a method for the formation of an organic semiconductor material film having improved mobility on a substrate, and a process for producing an organic thin film transistor which can develop high performance by utilizing the method. The production process of an organic thin film transistor utilizes the method for organic semiconductor material film formation, comprising coating an organic semiconductor material-containing liquid onto a surface of a substrate to form a semiconductor material thin film. The method for organic semiconductor material thin film formation is characterized in that, when the surface free energy of the surface of the substrate is &gammad _S = &gammad _S^d + &gammad _S^p + &gammad _S^h wherein &gammad _S^d, &gammad _S^p and &gammad _S^h respectively represent the nonpolar component, polar component, and hydrogen bond component of the surface free energy of the solid surface based on the Young-Fowkes equation, the surface free energy of a solvent in the liquid is &gammad _L = &gammad _L^d + &gammad _L^p + &gammad _L^h wherein &gammad _L^d, &gammad _L^p and &gammad _L^h respectively represent the nonpolar component, polar component, and hydrogen bond component of the surface free energy of the liquid based on the Young-Fowkes equation, the value of &gammad _S^h - &gammad _L^h is not less than -5 mN/m and not more than 20 mN/m, and that the hydrogen bond component &gammad _S^h of the surface free energy on the substrate surface is 0 <&gammad _S^h < 20 (mN/m).

Inventors:

SUGISAKI REIKO (JP)
TAKEMURA CHIYOKO (JP)
HIRAI KATSURA (JP)

Application Number:

PCT/JP2006/310177

Publication Date:

December 28, 2006

Filing Date:

May 23, 2006

Export Citation:

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Assignee:

KONICA MINOLTA HOLDINGS INC (JP)
SUGISAKI REIKO (JP)
TAKEMURA CHIYOKO (JP)
HIRAI KATSURA (JP)

International Classes:

H01L21/368; H01L21/336; H01L29/786; H01L51/40

Foreign References:

JP2004273678A	2004-09-30
JP2004214482A	2004-07-29
JP2004006758A	2004-01-08

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