Title:
METHOD FOR PATTERNING THICK-FILM PASTE MATERIAL LAYER, METHOD FOR MANUFACTURING COLD-CATHODE FIELD ELECTRON EMISSION DEVICE, AND METHOD FOR MANUFACTURING COLD-CATHODE FIELD ELECTRON EMISSION DISPLAY
Document Type and Number:
WIPO Patent Application WO/2003/083889
Kind Code:
A1
Abstract:
A cold-cathode field electron emission device manufacturing method, wherein a cathode (11), an insulating layer (12), and a gate electrode (13) are formed, an opening (14) is formed in the gate electrode (13) and the insulating layer (12) to exposed the cathode (11), a resist material layer (20) covering the side face of the opening (14), the gate electrode (13), and the insulating layer (12) is formed, a modified layer (21) is formed by modifying the surface of the resist material layer, an electron emitting part (15) composed of a thick-film paste material layer (22) is formed on the cathode (11) located on the bottom of the opening (14), and the resist material layer (20) is removed.
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Inventors:
Toyota, Motohiro c/o SONY CORPORATION (7-35 Kitashinagawa 6-chom, Shinagawa-ku Tokyo, 141-0001, JP)
Ishiwata, Mika c/o SONY CORPORATION (7-35 Kitashinagawa 6-chom, Shinagawa-ku Tokyo, 141-0001, JP)
Ishiwata, Mika c/o SONY CORPORATION (7-35 Kitashinagawa 6-chom, Shinagawa-ku Tokyo, 141-0001, JP)
Application Number:
PCT/JP2003/003417
Publication Date:
October 09, 2003
Filing Date:
March 20, 2003
Export Citation:
Assignee:
SONY CORPORATION (7-35, Kitashinagawa 6-chome Shinagawa-ku, Tokyo, 141-0001, JP)
Toyota, Motohiro c/o SONY CORPORATION (7-35 Kitashinagawa 6-chom, Shinagawa-ku Tokyo, 141-0001, JP)
Ishiwata, Mika c/o SONY CORPORATION (7-35 Kitashinagawa 6-chom, Shinagawa-ku Tokyo, 141-0001, JP)
Toyota, Motohiro c/o SONY CORPORATION (7-35 Kitashinagawa 6-chom, Shinagawa-ku Tokyo, 141-0001, JP)
Ishiwata, Mika c/o SONY CORPORATION (7-35 Kitashinagawa 6-chom, Shinagawa-ku Tokyo, 141-0001, JP)
International Classes:
H01J9/02; G03F7/40; H01J1/304; H01J31/12; (IPC1-7): H01J9/02; G03F7/40
Attorney, Agent or Firm:
Yamamoto, Takahisa (Room 301, Akiba Building 3-2, Ohsaki 4-chom, Shinagawa-ku Tokyo, 141-0032, JP)
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